The talk of pushing back to the 7 and 5nm nodes was referring to that EUV may be able to work there as well instead of hitting a wall at 10nm.
And please read again carefully:
According to TSMCs Mark Liu, As you can see in our 7-nanometer development schedule that probably will not using EUV. But we are planning to exercise EUV using the 7-nanometer technology and currently we are planning to use EUV at 5-nanometer. But of course it does depend certain development criteria, milestones to be reached. And it has a good benefit from our assessment on the 7 on the 5-nanometer that reduce a lot of many masking layers and increase a lot of better control for the 5-nanometer.
TSMC thinks that they can even handle 7nm without EUV!